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<p>We present a technique to fabricate single-electron transistors (SETs) with silicon quantum dots (QDs) as conducting islands making use of a combination of self-assembly and self-alignment effects. Starting from an ultra-thin silicon-on-insulator (SOI) substrate we<br>employ self-assembled gold colloidal particles as an etch mask. Quantum dots are then fabricated by applying a CF<sub>4</sub> reactive ion etch<br>(RIE) process to remove the silicon layer everywhere except below the gold colloids. A 100-200 nm wide metal wire together with side<br>gate electrodes is patterned by electron beam lithography (EBL) onto the QD-covered sample and a nanometer-sized gap is created in these wires by a controlled electromigration process. The metal wires will preferentially break at the positions of the QDs, because the metal layer is dilated there resulting in a locally higher current density. This leads to a self-alignment effect of the evolving nano-electrodes with respect to the QDs. The native oxide layer covering the silicon QDs is used as a tunneling barrier. Its thickness can optionally be adjusted in a controlled manner by self-limiting thermal oxidation to obtain an accurate tunneling resistance. The devices are electrically characterized at liquid helium temperature and show clear Coulomb blockade behavior, Coulomb staircase features as well as the so-called Coulomb diamonds, typical for SETs.<br></p>
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Wolf, Conrad R.; Thonke, Klaus; Sauer, Rolf (2007): SOI-based single-electron transistors fabricated by a combination of self-assembly and self-alignment techniques. DPG Frühjahrstagung 2007 (Regensburg).
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The website of Coburg University of Applied Sciences was translated using translation software provided by a third-party provider such as DeepL. The official text is the German version of the website. No liability is assumed, either explicitly or implicitly, for the accuracy, reliability, or correctness of the translations into another language.

SOI-based single-electron transistors fabricated by a combination of self-assembly and self-alignment techniques

We present a technique to fabricate single-electron transistors (SETs) with silicon quantum dots (QDs) as conducting islands making use of a combination of self-assembly and self-alignment effects. Starting from an ultra-thin silicon-on-insulator (SOI) substrate we
employ self-assembled gold colloidal particles as an etch mask. Quantum dots are then fabricated by applying a CF4 reactive ion etch
(RIE) process to remove the silicon layer everywhere except below the gold colloids. A 100-200 nm wide metal wire together with side
gate electrodes is patterned by electron beam lithography (EBL) onto the QD-covered sample and a nanometer-sized gap is created in these wires by a controlled electromigration process. The metal wires will preferentially break at the positions of the QDs, because the metal layer is dilated there resulting in a locally higher current density. This leads to a self-alignment effect of the evolving nano-electrodes with respect to the QDs. The native oxide layer covering the silicon QDs is used as a tunneling barrier. Its thickness can optionally be adjusted in a controlled manner by self-limiting thermal oxidation to obtain an accurate tunneling resistance. The devices are electrically characterized at liquid helium temperature and show clear Coulomb blockade behavior, Coulomb staircase features as well as the so-called Coulomb diamonds, typical for SETs.

Titel:

SOI-based single-electron transistors fabricated by a combination of self-assembly and self-alignment techniques

Veröffentlichungsdatum:

04.05.2007

Publikationsart:

Vorträge

Forschungsschwerpunkt:

Medien:

DPG Frühjahrstagung 2007 (Regensburg)

DOI:

Weblink:

Heft:

Band:

Artikelnummer:

ISBN:

Autoren:

Conrad Wolf, Klaus Thonke, Rolf Sauer

Medien:

DPG Frühjahrstagung 2007 (Regensburg)

Herausgeber:

Seiten:

Open Access:

Peer reviewed:

Nein

Zitierung:

Wolf, Conrad R.; Thonke, Klaus; Sauer, Rolf (2007): SOI-based single-electron transistors fabricated by a combination of self-assembly and self-alignment techniques. DPG Frühjahrstagung 2007 (Regensburg).

Autoren:

Conrad Wolf, Klaus Thonke, Rolf Sauer